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6 More Hollow Cathode Plasma Assisted Film Growth Publications

Meaglow_ALDSix new journal publications from three groups can be found on our website, with links to the publishers for downloading the articles. See The titles are::

“Low-temperature self-limiting atomic layer deposition of wurtzite InN on Si(100)”

“Comparison of trimethylgallium and triethylgallium as “Ga” source materials for the
growth of ultrathin GaN films on Si (100) substrates via hollow-cathode plasma assisted
atomic layer deposition”

“Substrate temperature influence on the properties of GaN thin films grown by hollow cathode plasma-assisted atomic layer deposition”

Low-temperature sequential pulsed chemical vapor deposition of ternary BxGa1-xN
and BxIn1-xN thin film alloys

“Self-Catalytic Growth of InN Nanowires”

Optoelectronic and structural properties of InGaN grown by Migration-Enhanced, Plasma-Assisted MOCVD

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