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Archive for category: Hollow Cathode Plasma Source

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Ammonium Nitrate Sensor/ALD Paper From Oklahoma State University

IMG-3804Congratulations to Prof. Dave McIlroy’s group, at the Physics Department of Oklahoma State University, for their recent publication in ACS Sensors Vol. 3 (2018) pg. 2367. The paper, authored by Lyndon Bastatas, provides some of the first results from the Okyay Tech ALD system recently acquired by that group. The ALD system includes a 4″ diameter Meaglow hollow cathode plasma source that was used to pretreat silica nanowire mat samples prior to the thermal deposition of ZnO in the Okyay Tech system. The ALD steps were part of a process to make a collection of 1D structures for ammonium nitrate sensors.

The picture shows Aaron Austin, one of the Oklahoma team next to the Okyay Tech ALD system with Mealgow plasma source shown at the top. Apparently more papers are on the way, with another 2019 publication already available. Meaglow is pleased to be an enabler of this next generation of research, check our products at www.meaglow.com.

 

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Meaglow Plasma Source Provides Breakthrough for Advanced Semiconductor Production Technique

Meaglow Ltd. (Privately Held) announces a breakthrough in semiconductor production. As computer chips become smaller and smaller, advanced production techniques, such as Atomic Layer Deposition (ALD) have become more important for depositing thin layers of material. Unfortunately the ALD of some materials has been prone to contamination from the plasma sources used. Meaglow Ltd has developed a hollow cathode plasma source which has reduced oxygen contamination by orders of magnitude, allowing the reproducible deposition of semiconductor materials with improved quality.

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Meaglow Hollow Cathode Plasma Source to Upgrade Atomic Layer Deposition at Bilkent University

Meaglow Ltd. (Privately Held) announces the installation of a hollow cathode plasma source for the group of Professor Necmi Biyikli, of the Institute of Materials Science and Nanotechnology, at Bilkent University in Turkey. The plasma source is being used to upgrade their Atomic Layer Deposition (ALD) system by replacing an inductively coupled plasma source. This enhancement will reduce the oxygen contamination in ALD systems and increase the quality of Nitride thin films grown.

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Meaglow Hollow Cathode Plasma Source Goes to GSU

GSU_Plasma_Source

Meaglow Ltd. (Privately Held) announces the sale of a prototype hollow cathode plasma source to Georgia State University (GSU) in the United States. The plasma source will be used for the conversion of a low pressure MOCVD system to a plasma deposition unit. Meaglow has demonstrated great success in the deposition of high indium content InGaN with its hollow cathode plasma source and recently demonstrated a yellow LED in collaboration with Lakehead University in Thunder Bay, Canada.

Meaglow is now focused on commercializing its hollow cathode plasma technology, and is looking for partners interested in developing the plasma source for MBE and other applications. Interested parties should email science@meaglow.com

 

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