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6 More Hollow Cathode Plasma Assisted Film Growth Publications

Meaglow_ALDSix new journal publications from three groups can be found on our website, with links to the publishers for downloading the articles. See The titles are::

“Low-temperature self-limiting atomic layer deposition of wurtzite InN on Si(100)”

“Comparison of trimethylgallium and triethylgallium as “Ga” source materials for the
growth of ultrathin GaN films on Si (100) substrates via hollow-cathode plasma assisted
atomic layer deposition”

“Substrate temperature influence on the properties of GaN thin films grown by hollow cathode plasma-assisted atomic layer deposition”

Low-temperature sequential pulsed chemical vapor deposition of ternary BxGa1-xN
and BxIn1-xN thin film alloys

“Self-Catalytic Growth of InN Nanowires”

Optoelectronic and structural properties of InGaN grown by Migration-Enhanced, Plasma-Assisted MOCVD

A big thanks to our customers and collaborators for being so productive, we’re glad our hollow cathode plasma sources have given you that technology edge!


Meaglow to be at ALD2016 in Dublin

IMG_1875Meaglow’s Chief Scientist, Dr Butcher, and our Korean agents from Paultec will be there.

Meaglow will have table 28 of the exhibits. We are extremely pleased that representatives of our Korean agency, Paultec, will also be present, including Mr. Dong-Hyun Kim. A series 50 plasma source, one of our most popular sources, will be brought to the exhibition. Come and talk to us about reducing oxygen levels in nitride films. We hope to see you in Dublin on the 24th-27th of July.


Meaglow Hollow Cathode Plasma Source for NASA


The NASA Jet Propulsion Laboratory (JPL) have converted one of their ALD systems to a custom made Meaglow hollow cathode plasma source. This is an 8″ diametre plasma source, one of our biggest in recent years. The source was delivered early this year and has apparently been running extremely well. Results may be presented later this year.


ALD Nanosolutions & Meaglow Partner

ALD Nanosolutions/Meaglow Development Partnership

THUNDER BAY, ONTARIO–(April 21, 2015) ALD NanoSolutions and Meaglow are pleased to announce an exclusive partnership for the development and marketing of hollow cathode plasma sources uniquely suited for atomic layer deposition onto particles. An ALD NanoSolutions particle reactor combined with a Meaglow plasma source allows newly developed plasma ALD chemistries to be performed onto particles in appreciable quantities. This expanded capability enables development of new materials and their eventual commercialization.

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