Low Growth Temperature
Crystal growth at less than 650°C, resulting in less bowing of thin films allowing for utilization of larger substrates.
Scalable Plasma Source
Comes standard with a Meaglow Hollow Cathode Plasma Source. Fully scalable, removes oxygen contamination, and improves crystallinity.
Ammonia & Hydrogen Free Process
Requires less cleaning, fewer input materials, and is one of the safest research nitride film growth systems available.
Low Cost of Ownership
Lower maintenance for cleaning, less input materials, and other ways to save your lab money while performing next generation science.
Low Power Consumption
Reduce your power output both while running and at system startup to save money and do more science.
Meaglow is pleased to offer a wide array of solutions depending on the industry or research needs of customers.