Unlock the Full Potential of ALD, ALE or CVD using Meaglow hollow cathode plasma sources and deposition equipment.
Our Plasma Sources have been used with Ammonia, Argon, Chlorine, Hydrogen, Nitrous Oxide, Oxygen, Nitrogen, and other gases too.
Some of our past plasma source customers include:
- US Naval Research Laboratories (3 sources)
- National Taiwan University (3 sources)
- ALD Nanosolutions (3 sources)
- Okyay Enerji (3 sources)
- NASA Jet Propulsion Laboratories (2 sources)
- University of Texas, Dallas (2 sources)
- The Indian Institute of Technology, Bombay (2 sources)
- Lawrence Berkeley Laboratories
- US Army Research Laboratories
- University of Colorado, Boulder
- Boston College
- Bilkent University
- Montreal Polytechnique
- Qorvo
- The University of Connecticut
- Entegris
- Paultec
- California Institute of Technology
- Ben-Gurion University of the Negev
- Otto-Von-Guericke-Universitat Magdeburg
- The University of Liverpool
- Oklahoma State University
Among others
The Meaglow hollow cathode plasma source strikes easily in a very wide pressure range that gives us a lot of versatility
Dr. Joe Spencer
The Meaglow hollow cathode plasma system has allowed our group to deposit SiN films using a variety of precursors. We consistently obtain excellent film properties and have observed a number of unique characteristics due to the hollow cathode plasma source.
Dr. Antonio Lucero
The Meaglow Plasma Source is an amazing piece of technology that has huge potential to change material science forever.
Richard Stevenson
Meaglow’s Next Generation Plasma Source allowed our team to grow better GaN films with faster growth rates at lower temperatures.
Necmi Biyilki